Integrated silicon circuits, present in everything from coffeemakers to computers, are very thin—but researchers think they can push thin-film boundaries to the single-atom level.
The Cornell University scientists’ technique, which they call patterned regrowth, could lead to substrate-free, atomically thin circuits—so thin, they could float on water or through air, but with tensile strength and top-notch electrical performance.
Full story at Futurity.
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Photo credit: Jiwoong Park